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PhotoSHIELD™ Nylon Filter Cartridges and Capsules
Superior Gel and Particle Removal from Photoresist and Ancillary Chemicals
PhotoSHIELD(tm) Nylon filter cartridges and capsules are highly retentive membrane filter elements designed to meet the exacting requirements of photoresist and ancillary chemical applications. Utilizing CUNO patented* Advanced Pleat Technology™ (APT), PhotoSHIELD combines superior flow characteristics with minimal pressure drop, while maintaining filter efficiency. The resultant decrease in processing time provides lower total filtration costs - reduced energy consumption, pump wear, and labor.
The native characteristics of photoresists, ancillary chemicals, and filters vary greatly from one manufacturer to the next. A filtration solution individually matched to the unique requirements of the material being filtered is critical for peak performance. When choosing the appropriate filter, important characteristics to consider include membrane wettability, pore size, pressure drop, retention efficiency, and fluid viscosity.
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