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DI Water | Chemicals | Gas | Photolithography | CMP
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CMP Applications

Unlike traditional filtration, the objective of a slurry filter is for the majority of particles to pass through it unchanged, while only removing the undesired or "oversized" particles. These oversized particles are commonly referred to as large particle counts (LPC) and they typically form over time when the suspended particles in the slurry settle forming aggregates, agglomerates, and gels. Large particle counts can also occur due to shipping conditions, shearing, slurry drying, and interaction with other components in the distribution loop like fittings, valves, pumps, and piping. These large particles can scratch inter-level dielectrics and metal layers potentially causing wafer defects.

It is important to recognize that slurries vary greatly from one manufacturer to another, and therefore a customized solution is required. Several factors are important in selecting the appropriate slurry filter of which particle classification, retention efficiency, flow rate, differential pressure, contaminant holding capacity, and filter lifetime are some of the most important.



Recommended CUNO Filters for CMP Applications

Application

Recommended CUNO Filter

Literature Reference #

Post Blending

OPTIMA™CMP570 &
OPTIMA™CMP560

LITCCMPCTG1 & LITCCMPCAP1

Slurry Distribution Loop

OPTIMA™CMP580OPTIMA™CMP570,
OPTIMA™CMP560OPTIMA™CMP550

LITCCMPCTG1 & LITCCMPCAP1

Point-Of-Use

OPTIMA™CMP540OPTIMA™CMP530,
OPTIMA™CMP520OPTIMA™CMP510

LITCCMPCTG1 & LITCCMPCAP1

Point-of-Use DI Water

Electropor® II EF

LITZREL02

NanoSHIELD™Cartridge

LITNSHLDCTG1

NanoSHIELD™LDC

LITNSHLDLDC1

NanoSHIELD™MDC

LITNSHLDMDC1

Post CMP Clean

PhotoSHIELD™

LITCPSLD1

Microfluor®

LITMRFA3

NanoSHIELD™Cartridge

LITNSHLDCTG1

NanoSHIELD™LDC

LITNSHLDLDC1

NanoSHIELD™MDC

LITNSHLDMDC1

CMP Slurry Wastewater

PolyKLEAN™

LITCPOLYKLN

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